Near Defect Free GaN Substrates

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Shallow optically active structural defect in wurtzite GaN epilayers grown on stepped 4H-SiC substrates

A number of wurtzite GaN epilayers directly grown on 4H-SiC ~0001! misoriented by 0, 3.5°, 5°, 8°, and 21° with plasma-assisted molecular-beam epitaxy were optically characterized with photoluminescence and excitation spectra. An intense shallow-defect emission peak locating at energy position ;70 meV lower than the near band edge emission peak at 3.47 eV is found in the emission spectra of the...

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Layered transition metal dichalcogenides: promising near-lattice-matched substrates for GaN growth

Most III-nitride semiconductors are grown on non-lattice-matched substrates like sapphire or silicon due to the extreme difficulty of obtaining a native GaN substrate. We show that several layered transition-metal dichalcogenides are closely lattice-matched to GaN and report the growth of GaN on a range of such layered materials. We report detailed studies of the growth of GaN on mechanically-e...

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ژورنال

عنوان ژورنال: MRS Internet Journal of Nitride Semiconductor Research

سال: 1999

ISSN: 1092-5783

DOI: 10.1557/s1092578300002210